Semiconductor package with improved interposer structure

ABSTRACT

A semiconductor package is provided. The semiconductor package includes an encapsulating layer, a semiconductor die formed in the encapsulating layer, and an interposer structure covering the encapsulating layer. The interposer structure includes an insulating base having a first surface facing the encapsulating layer, and a second surface opposite the first surface. The interposer structure also includes insulting features formed on the first surface of the insulating base and extending into the encapsulating layer. The insulting features are arranged in a matrix and face a top surface of the semiconductor die. The interposer structure further includes first conductive features formed on the first surface of the insulating base and extending into the encapsulating layer. The first conductive features surround the matrix of the plurality of insulting features.

PRIORITY CLAIM AND CROSS-REFERENCE

This application is a Continuation of U.S. patent application Ser. No.16/406,600, filed May 8, 2019, which claims the benefit of U.S.Provisional Application No. 62/787,493, filed on Jan. 2, 2019, andentitled “Semiconductor package structure with interposer and method forforming the same”, the entirety of which is incorporated by referenceherein.

BACKGROUND

Semiconductor devices are used in a variety of electronic applications,such as, for example, personal computers, cell phones, digital cameras,and other electronic equipment. Semiconductor devices are typicallyfabricated by sequentially depositing insulating or dielectric layers,conductive layers, and semiconductor layers of material over asemiconductor substrate, and patterning the various material layersusing lithography and etching processes to form circuit components andelements thereon.

The semiconductor integrated circuit (IC) industry has experienced rapidgrowth. With the evolving of semiconductor technologies, semiconductorchips/dies are becoming increasingly smaller. Accordingly, the packagingof the semiconductor dies becomes more difficult, which adverselyaffects the yield of the packaging.

In one conventional package technology, dies are sawed from wafersbefore they are packaged. An advantageous feature of this packagingtechnology is the possibility of forming fan-out packages. Anotheradvantageous feature of this packaging technology is that“known-good-dies” are packaged, and defective dies are discarded, andhence money and effort are not wasted on the defective dies.

However, since device sizes continue to decrease, fabrication processescontinue to become more difficult to perform, and additional problemsarise that should be addressed.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It shouldbe noted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1A to 1E show cross-sectional representations of various stages offorming a semiconductor package, in accordance with some embodiments.

FIG. 1E-1 shows a cross-sectional representation of a semiconductorpackage, in accordance with some embodiments.

FIG. 1E-2 shows a cross-sectional representation of a semiconductorpackage, in accordance with some embodiments.

FIGS. 2A to 2E show cross-sectional representations of various stages offorming an interposer structure, in accordance with some embodiments.

FIG. 3A is a plan view of the region 1000 in FIG. 1E, in accordance withsome embodiments.

FIG. 3B is a plan view of the region 1001 in FIG. 1E-1 , in accordancewith some embodiments.

FIG. 3C is a plan view of the region 1002 in FIG. 1E-2 , in accordancewith some embodiments.

FIG. 4A shows a cross-sectional representation of a semiconductorpackage, in accordance with some embodiments.

FIG. 4B is a plan view of the region 2000 in FIG. 4A, in accordance withsome embodiments.

FIG. 5A shows a cross-sectional representation of a semiconductorpackage, in accordance with some embodiments.

FIG. 5B is a plan view of the region 2001 in FIG. 5A, in accordance withsome embodiments.

FIG. 6A shows a cross-sectional representation of a semiconductorpackage, in accordance with some embodiments.

FIG. 6B is a plan view of the region 2005 in FIG. 6A, in accordance withsome embodiments.

FIGS. 7A to 7D show cross-sectional representations of various stages offorming a semiconductor package, in accordance with some embodiments.

FIG. 8A is an enlarged cross-sectional representation of the region 3000in FIG. 7D, in accordance with some embodiments.

FIG. 8B is a plan view of an interposer structure having the recessshown in FIG. 8A, in accordance with some embodiments.

FIG. 8C is a plan view of an interposer structure having recesses, inaccordance with some embodiments.

FIG. 9A is an enlarged cross-sectional representation of a recess forthe structure shown in FIG. 7D, in accordance with some embodiments.

FIG. 9B is a plan view of an interposer structure having the recessshown in FIG. 9A, in accordance with some embodiments.

FIG. 9C is a plan view of an interposer structure having recesses, inaccordance with some embodiments.

FIG. 10A is an enlarged cross-sectional representation of a recess forthe structure shown in FIG. 7D, in accordance with some embodiments.

FIG. 10B is a plan view of an interposer structure having the recessshown in FIG. 10A, in accordance with some embodiments.

FIG. 10C is a plan view of an interposer structure having recesses, inaccordance with some embodiments.

FIG. 11A is an enlarged cross-sectional representation of a recess forthe structure shown in FIG. 7D, in accordance with some embodiments.

FIG. 11B is a plan view of an interposer structure having the recessshown in FIG. 11A, in accordance with some embodiments.

FIG. 11C is a plan view of an interposer structure having recesses, inaccordance with some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the subject matterprovided. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows includes embodiments in which the first and second features areformed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact.The present disclosure may repeat reference numerals and/or letters insome various examples. This repetition is for the purpose of simplicityand clarity and does not in itself dictate a relationship between somevarious embodiments and/or configurations discussed.

Furthermore, spatially relative terms, such as “beneath,” “below,”“lower,” “above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

Some embodiments of the disclosure are described. Additional operationscan be provided before, during, and/or after the stages described inthese embodiments. Some of the stages that are described can be replacedor eliminated for different embodiments. Additional features can beadded to the semiconductor device structure. Some of the featuresdescribed below can be replaced or eliminated for different embodiments.Although some embodiments are discussed with operations performed in aparticular order, these operations may be performed in another logicalorder.

A semiconductor package with improved interposer structure and themethod of forming the same are provided in accordance with variousexemplary embodiments. The various stages of forming the semiconductorpackage are illustrated. The variations of the embodiments are alsodiscussed. Throughout the various views and illustrative embodiments,like reference numbers are used to designate like elements.

Other features and processes may also be included. For example, testingstructures may be included to aid in the verification testing of the 3Dpackaging or 3DIC devices. The testing structures may include, forexample, test pads formed in a redistribution layer or on a substratethat allows the testing of the 3D packaging or 3DIC, the use of probesand/or probe cards, and the like. The verification testing may beperformed on intermediate structures as well as the final structure.Additionally, the structures and methods disclosed herein may be used inconjunction with testing methodologies that incorporate intermediateverification of known good dies to increase the yield and decreasecosts.

Embodiments of the semiconductor package includes an interposerstructure formed over the encapsulating layer that covers and surroundsa semiconductor die on the interconnect structure. The interposerstructure includes an insulating base and island layers arranged on thesurface of the insulating base that faces the encapsulating layer. Theisland layers facilitate the flowability of an encapsulating materialbetween the semiconductor die and the interposer structure. As a result,the gap between the semiconductor die and the interposer structure canbe filled with the subsequently formed encapsulating layer to preventvoids from forming in the gap, thereby increasing the reliability of thesemiconductor package. In some embodiments, the interposer structureincludes dummy through-vias formed in the insulating base. Those dummythrough-vias enhance the rigidity for the interposer structure. As aresult, the deformation or warpage of the interposer structure can bemitigated or eliminated, thereby reducing the package warpage. In someembodiments, the interposer structure includes a passivation layercovering the surface of the insulating base opposite the encapsulatinglayer. The passivation layer has one or more recesses extended along oneor more peripheral edges of the insulating base. The recess prevents theencapsulating material from creeping across the top surface of thepassivation layer to contaminate pads that are exposed from thepassivation layer for external connection. As a result, the yield andreliability of the semiconductor package can be increased.

FIGS. 1A to 1E show cross-sectional representations of various stages offorming a semiconductor package 10 a, in accordance with someembodiments. A carrier substrate 100 covered by an adhesive layer 102 isprovided, as shown in FIG. 1A in accordance with some embodiments. Insome embodiments, the carrier substrate 100 includes, for example,silicon based materials, such as glass or silicon oxide, or othermaterials, such as aluminum oxide, combinations of any of thesematerials, or the like. The adhesive layer 102 is placed over thecarrier substrate 100 in order to assist in the formation of overlyingstructures to the carrier substrate 100. In some embodiments, theadhesive layer 102 is a die attached film (DAF), such as an epoxy resin,a phenol resin, silica filler, or a combination thereof, and is appliedusing a lamination technique. The adhesive layer 102 may be a releasefilm such as a light-to-heat-conversion (LTHC) film or a combinationwith a die attached film (DAF) thereof. However, any other suitablematerial and method of formation may be utilized.

After the adhesive layer 102 has been placed over the carrier substrate100, an interconnect structure 110 is formed over the carrier substrate100 via the adhesive layer 102. The interconnect structure 110 may beused as a fan-out redistribution (RDL) structure for routing. In someembodiments, the interconnect structure 110 includes one or moreconductive layers 105 (such as two or three conductive layers) embeddedwithin one or more dielectric layers 103 (such as three or fourdielectric layers) that provide not only conductive routing for signals,but which may also provide structures such as integrated inductors orcapacitors. In some embodiments, the dielectric layer 103 includes amaterial such as polybenzoxazole (PBO), polyimide (PI), one or moreother suitable polymer materials, or a combination thereof, although anysuitable material (such as silicon oxide, silicon carbide, siliconnitride, silicon oxynitride, one or more other suitable materials, or acombination thereof) may be utilized. The dielectric layers 103 may beformed by, e.g., a spin-coating process, although any suitable methodmay be used. After the first one of the dielectric layers 103 has beenformed, openings may be made through the first one of the dielectriclayers 103.

Once the first one of the dielectric layers 103 has been formed andpatterned, a first one of the conductive layers 105 (such as copper) isformed over the first one of the dielectric layers 103 and through theopenings that were formed within the first one of the dielectric layers103. In some embodiments, the first one of the conductive layers 105 isformed by a suitable formation process such as electroplating, chemicalvapor deposition (CVD) or sputtering. However, while the material andmethods discussed are suitable to form the conductive layer 105, thismaterial is merely exemplary. Any other suitable materials, such as AlCuor Au, and any other suitable processes of formation, such as CVD orphysical vapor deposition (PVD), may be used to form the conductivelayers 105.

Once the first one of the conductive layers 105 has been formed, asecond one of the dielectric layers 103 and a second one of theconductive layers 105 may be formed by repeating steps that are similarto the first one of the dielectric layers 103 and the first one of theconductive layers 105. These steps may be repeated as desired in orderto electrically connect between the conductive layers 105. In someembodiments, the deposition and patterning of the conductive layers 105and the dielectric layers 103 may be continued until the interconnectstructure 110 have a desired number of layers.

Afterwards, one or more semiconductor dies 114 is formed over theinterconnect structure, as shown in FIG. 1B, in accordance with someembodiments. The semiconductor die 114 is sawed from a wafer, and may bea “known-good-die”. In some embodiments, the semiconductor die 114provides logic functions for the structures. For example thesemiconductor die 114 is a system-on-chip (SoC) chip, although anysuitable semiconductor die may be utilized. In some embodiments, thesemiconductor die 114 includes a substrate, active devices (not shown),metallization layers (not shown), and contact pads. The substrate mayinclude bulk silicon, doped or undoped, or an active layer of asilicon-on-insulator (SOI) substrate. Generally, an SOI substrateincludes a layer of a semiconductor material such as silicon, germanium,silicon germanium, or combinations thereof. The active devices may beformed using any suitable methods either within or else on thesubstrate. The metallization layers are formed over the substrate andthe active devices and are designed to connect the various activedevices to form functional circuitry. In some embodiments, the firstmetallization layers are formed of alternating layers of dielectric andconductive material and may be formed through any suitable process (suchas deposition, damascene, dual damascene, etc.). The contact pads areformed over and in electrical contact with the metallization layers. Thecontact pads may include aluminum or copper and may be formed using adeposition process, such as sputtering, to form a layer of material andthe layer of material may then be patterned via a suitable process (suchas lithography and etching) to form the contact pads.

External connectors 112 is formed to provide conductive regions forcontact between the semiconductor die 114 and the interconnect structure110. The external connectors 112 may be conductive bumps (e.g.,microbumps) or conductive pillars utilizing materials such as solder andcopper. In some embodiments, the external connectors 112 are contactbumps. The external connectors 112 may comprise a material such as tin,or other suitable materials, such as silver, lead-free tin, or copper.

In some embodiments in which the external connectors 112 is formed byinitially forming a layer of metal (e.g., tin) via, for example,evaporation, electroplating, printing, solder transfer, or ballplacement. Once the layer of tin has been formed on the structure, areflow may be performed in order to shape the layer of tin into thedesired bump shape. In some other embodiments, the external connectors112 are conductive pillars, the external connectors 112 may be formed byinitially placing a photoresist and then patterning the photoresist intothe desired pattern for the conductive pillars. A plating process isthen utilized to form the conductive material (e.g., copper) inconnection with the contact pads. However, any suitable methods may beutilized.

In some embodiments, the semiconductor die 114 is placed on theinterconnect structure 110 using, e.g., a pick and place tool. Anoptional under bump metallization (UBM) layer (not shown) may be formedon the interconnect structure 110 prior to the placement of thesemiconductor die 114. In some embodiments, after the semiconductor die114 is bonded onto the interconnect structure 110, an underfill material115 is formed between the interconnect structure 110 and thesemiconductor die 114. The underfill material 115 is a material used toprotect and support the semiconductor die 114 from operational andenvironmental degradation, such as stresses caused by the generation ofheat during operation. The underfill material 115 may be made of anepoxy-based resin or other protective material. In some embodiments, theformation of the underfill material 115 involves an injecting process, adispensing process, a film lamination process, one or more otherapplicable processes, or a combination thereof. In some embodiments, athermal curing process is then used to cure the underfill material 115.

Next, an interposer structure 120 is provided and is ready to be bondedonto the interconnect structure 110 and cover the semiconductor die, asshown in FIGS. 1C and 1D in accordance with some embodiments. In someembodiments, the interposer structure 120 includes an insulating base121 with conductive features 122 a, 122 b, 124 a, and 124 b andpassivation layers 126 and 128 on opposite surfaces 121 a and 121 b ofthe insulating base 121, and through-vias 130 in the insulating base121, as shown in FIG. 1C. In some other embodiments, one or moreconductive features (such as trace layers or routing layers) are builtwithin the insulating base 121.

FIGS. 2A to 2E show cross-sectional representations of various stages offorming the interposer structure 120 shown in FIG. 1C, in accordancewith some embodiments. Conductive films 116 a and 116 b are formed overopposite surfaces 121 a and 121 b of the insulating base 121, as shownin FIG. 2A in accordance with some embodiments. The conductive films 116a and 116 b may be used to assist in a subsequent electroplatingprocess. In some embodiments, the insulating base 121 is made of orinclude a polymer material, a ceramic material or a glass. In some otherembodiments, the insulating base 121 include a substrate of ceramicmaterial, a metal material, or a semiconductor material with insulatinglayers on both sides of the substrate.

The conductive films 116 a and 116 b may be made of or include aluminum,copper, cobalt, gold, titanium, one or more other suitable materials, ora combination thereof. The conductive films 116 a and 116 b may beformed using a thermal compression process, a PVD process, a CVDprocess, a lamination process, a printing process, one or more otherapplication processes, or a combination thereof. However, embodiments ofthe disclosure are not limited thereto. In some other embodiments, theconductive films 116 a and 116 b are not formed.

After the conductive films 116 a and 116 b are formed, the conductivefilms 116 a and 116 b and the insulating base 121 are partially removedto form through-openings 117, as shown in FIG. 2B, in accordance withsome embodiments. In some embodiments, the through-openings 117penetrate through the insulating base 121 and the conductive films 116 aand 116 b. The through-openings 117 may be formed using an energy beamdrilling process, a mechanical drilling process, photolithography andetching processes, one or more other applicable processes, or acombination thereof. For example, the through-openings 117 are formedusing the energy beam drilling process, such as a laser drillingprocess, an ion beam drilling process, an electron beam drillingprocess, a plasma beam drilling process, one or more other applicableprocesses, or a combination thereof.

Afterwards, a seed layer (not shown) is formed over the structure shownin FIG. 2B in accordance with some embodiments. The seed layer extendsover the conductive films 116 a and 116 b. The seed layer also extendsover sidewalls of the through-openings 117. Afterwards, patternedphotoresist layers (not shown) are formed on the portion of the seedlayer extending over the conductive films 116 a and 116 b. The patternedphotoresist layers have openings that partially expose the seed layerand define patterns of conductive features to be formed on theinsulating base 121 later. Then, one or more conductive materials areelectroplated on the portions of the seed layer not covered by thepatterned photoresist layers. Afterwards, the patterned photoresistlayers are removed. One or more etching processes are used to remove theportions of the seed layer originally covered by the patternedphotoresist layers. The portions of the conductive films 116 a and 116 boriginally covered by the patterned photoresist layers are also removedduring the one or more etching processes.

After the one or more etching processes, the opposite surfaces 121 a and121 b of the insulating base 121 are partially exposed, as shown in FIG.2C in accordance with some embodiments. The remaining portions of theelectroplated conductive material, the remaining seed layer, and theremaining conductive films 116 a and 116 b together form conductivefeatures 122 a, 122 b, 124 a, and 124 b and through-vias 130 withdesired patterns. The through-vias 130 are formed in thethrough-openings 117 to penetrate through the insulating base 121 andprovide electrical connections between elements to be positioned on theopposite surfaces 121 a and 121 b of the insulating base 121.

In some embodiments, the conductive features 122 a and 124 a are used aspads and respectively in contact with opposite ends of the through-vias130. In some embodiments, the conductive features 122 b serve as dummypads with island-shaped and therefore are referred to as island layers.In some embodiments, the conductive features 124 b serve as trace layerswith desired circuit pattern. In some embodiments, the conductivefeatures 122 b and 124 b are surrounding by the conductive features 122a and 124 a.

Passivation layers 126 and 128 are respectively formed over the oppositesurfaces 121 a and 121 b of the insulating base 121, as shown in FIG. 2Din accordance with some embodiments. The passivation layers 126 and 128may be made of or include epoxy-based resin, polyimide (PI),polybenzoxazole (PBO), solder resist (SR), Ajinomoto build-up film(ABF), one or more other suitable materials, or a combination thereof.The passivation layer 126 has multiple openings that partially exposeeach of the conductive features 122 a and entirely expose all of theconductive features 122 b. In some embodiments, each of the exposedconductive features 122 b (i.e., the island layers) are covered andsurrounded by a capping layer 126 a. Those capping layers 126 a areseparated from each other. In some embodiments, those capping layers 126a and the passivation layer 126 are formed of a same layer, such as aninsulating material layer. The passivation layer 128 has multipleopenings that partially expose each of the conductive features 124 a andentirely covering all of the conductive features 122 b. The formation ofthe passivation layers 126 and 128 may involve a coating process and aphotolithography process. The coating process may include a spin coatingprocess, a spray coating process, a lamination process, one or moreother applicable processes, or a combination thereof.

Connectors 132 are respectively formed on and in direct contact with theconductive features 122 a, as shown in FIG. 2E in accordance with someembodiments. In some embodiments, connectors 132 are tin-containingsolder elements. The tin-containing solder elements may further includecopper, silver, gold, aluminum, lead, one or more other suitablematerials, or a combination thereof. In some embodiments, thetin-containing solder elements are lead free. The formation of theconnectors 132 may involve ball mount process, or one or more platingprocesses (such as electroplating processes) and/or one or more reflowprocesses. In some embodiments, the connectors 132 are conductivepillars and is made of or include copper, aluminum, titanium, cobalt,gold, tin-containing alloys, one or more other suitable materials, or acombination thereof. The conductive pillars may be formed using anelectroplating process, an electroless plating process, a PVD process, aCVD process, one or more other applicable processes, or a combinationthereof. Afterwards, a singulation process may be carried out to sawthrough the structure. As a result, multiple interposer structures 120are formed. In FIG. 2E, one of the interposer structures 120 is shown.In some embodiments, the capping layer 126 a of the interposer structure120 has a height H1 and the interposer structure 120 has a height H2, asshown in FIG. 1C. In some embodiments, the height H1 is in a range fromabout 3 μm to about 40 μm. The height H2 is in a range from about 50 μmto about 900 μm.

Referring back to FIG. 1C, the interposer structure 120 is mounted ontothe interconnect structure 110 and covers the semiconductor die 114 bybonding the connectors 132 to the interconnect structure 110, inaccordance with some embodiments. The conductive features 124 a (i.e.,pads) of the interposer structure 120 is electrically coupled to theinterconnect structure 110 by the through-vias 130, the conductivefeatures 122 a (i.e., pads), and the connectors 132. As a result, theconductive features 124 a can provide an electrical connection betweenthe semiconductor die 114 and one or more external devices (not shown,such as a memory device (e.g., DRAM)) via this electrical path. In someembodiments, each of the conductive features 122 b (i.e., the islandlayers) covered by the capping layer 126 a corresponds to and spacedapart from the underlying semiconductor die 114. For example, theconductive features 122 b (i.e., the island layers) covered by thecapping layers 126 a are located on a central area of the surface 121 aof the insulating base 121, so as to form a gap between the cappinglayers 126 a and the semiconductor die 114 and a space between theinterconnect structure 110 and the interposer structure 120.

Afterwards, an encapsulating layer 140 fills in the space between theinterconnect structure 110 and the interposer structure 120, as shown inFIG. 1D, in accordance with some embodiments. The encapsulating layer140 surrounds and protects the connectors 132. The encapsulating layer140 also covers and surrounds the semiconductor die 114 and theunderfill material 115, so as to fill the gap between the capping layers126 a and the semiconductor die 114. As a result, a portion of theencapsulating layer 140 is sandwiched by the conductive features 122 b(i.e., the island layers) covered and surrounded by the capping layers126 a.

The encapsulating layer 140 may be made of a material that is the sameas or different from that of the underfill material 115. As the cases ofthe encapsulating layer 140 made of a material that is the same as theunderfill material 115, the underfill material 115 may be omitted fromthe structure shown in FIG. 1D. As the cases of the encapsulating layer140 made of a material that is different form the underfill material115, the encapsulating layer 140 may include a molding compoundmaterial, such as an epoxy-based resin. In some embodiments, a liquidencapsulating material (not shown) is applied over the semiconductor die114. The liquid encapsulating material may flow into the space betweenthe interconnect structure 110 and the interposer structure 120 and thegap between the capping layers 126 a and the semiconductor die 114. Athermal process is then used to cure the liquid encapsulating material.As a result, the interposer structure 120 is separated from thesemiconductor die 114 by the cured encapsulating material to form theencapsulating layer 140, and the connectors 132 are embedded in theencapsulating layer 140.

Afterwards, the carrier substrate 100 and the adhesive layer 102 areremoved from the structure shown in FIG. 1D, and external connectors 150are formed, as shown in FIG. 1E in accordance with some embodiments. Insome embodiments, after the carrier substrate 100 and the adhesive layer102 are removed to expose the bottom surface of the interconnectstructure 110 (i.e., the surface of the interconnect structure 110opposite the semiconductor die 114), the external connectors 150 areformed over the bottom surface of the interconnect structure 110. Insome embodiments, the external connectors 150 are made of or includesolder bumps such as tin-containing solder bumps. The tin-containingsolder bumps may further include copper, silver, gold, aluminum, lead,one or more other suitable materials, or a combination thereof. In someembodiments, the tin-containing solder bump is lead free. Afterwards, areflow process is then carried out to melt the solder bumps into solderballs to form the external connectors 150. In some other embodiments,optional UBM layers are formed over the exposed bottom surface of theinterconnect structure 110 prior to the formation of the solder bumps.In some embodiments, a singulation process is then carried out to sawthrough the formed structure. As a result, multiple separatesemiconductor packages 10 a are formed. In FIG. 1E, one of thesemiconductor packages 10 a is shown.

It should be noted that during the formation of the encapsulating layer140, if the interposer structure 120 has a substantially flat bottomsurface (i.e., the surface face to the semiconductor die 114), the gapbetween the interposer structure 120 and the semiconductor die 114 isdifficult to be filled with the liquid encapsulating material.Therefore, unwanted voids may form in the gap between the interposerstructure 120 and the semiconductor die 114 and the reliability of thepackage structure is decreased. In order to avoid or reduce voidformation, the conductive features 122 b (i.e., the island layers)covered and surrounded by the capping layers 126 a formed over thesurface 121 a of the insulating base 121 form a trench between the twoadjacent capping layers 126 a, and therefore the liquid encapsulatingmaterial flows smoothly and easily into the gap via those trenchesbetween the adjacent capping layers 126 a. As a result, such a voidformation issue can be mitigated or eliminated, thereby increasing thereliability of the package structure.

Referring to FIG. 3A, which shows a plan view of the region 1000 in FIG.1E, in accordance with some embodiments. In FIG. 3A, a partiallyarrangement of the conductive features 122 b (i.e., the island layers)covered and surrounded by the capping layers 126 a is illustrated. Insome embodiments, the top views of those conductive features 122 b havea square shape, and those conductive features 122 b are regularlyarranged in a matrix over the surface 121 a of the insulating base 121,so as to form trenches 118 adjacent to the conductive features 122 bthat are respectively covered and surrounded by a capping layer 126 a.The trench 118 provides a space to allow the subsequent encapsulatinglayer 140 formed therein, so that a portion of the encapsulating layer140 is sandwiched by the conductive features 122 b (which are coveredand surrounded by the capping layers 126 a), as shown in FIG. 1E.

However, as one having ordinary skill in the art will recognize, thearrangement, the shape, and the number of the conductive features 122 bdescribed above are merely exemplary and are not meant to limit thecurrent embodiments. The shape and the number of the conductive features122 b can be varied or modified in some other embodiments. For example,the conductive features 122 b may have a circular, triangular, orrectangular shape, as viewed from a top-view perspective, and the numberof the conductive features 122 b may be more or less than that shown inFIG. 3A. Moreover, those conductive features 122 b also can beirregularly arranged in some other embodiments.

Moreover, although the semiconductor package 10 a shown in FIG. 1Eincludes capping layers 126 a separated from each other and from thepassivation layer 126, embodiments of the disclosure are not limitedthereto. Many variations and/or modifications can be made to embodimentsof the disclosure.

FIG. 1E-1 shows a cross-sectional representation of a semiconductorpackage 10 b, in accordance with some embodiments. The semiconductorpackage 10 b is similar to the semiconductor package 10 a shown in FIG.1E, except that the passivation layer 126 are extended to the surface121 a of the insulating base 121 that is uncovered by the conductivefeatures 122 b and the capping layers 126 a. Therefore, portions of thepassivation layer 126 are in direct contact with the of capping layers126 a, so that the trenches formed between the conductive features 122 b(which are covered by the capping layers 126) have a bottom formed ofthe portions of the passivation layer 126. In some embodiments, the topsurfaces 123 a of the portions of the passivation layer 126 are lowerthan the top surfaces 123 b of the capping layers 126 a as measured fromthe surface 121 a of the insulating base 121. In some other embodiments,the passivation layer 126 and the capping layers 126 a are formed of asame layer (such as an insulating material layer), so that there is nointerface between the passivation layer 126 and each of the cappinglayers 126 a. Methods and materials used to form the semiconductorpackage 10 b in FIG. 1E-1 may be the same as, or similar to those usedto form the semiconductor package 10 a and are not repeated herein.

Referring to FIG. 3B, which shows a plan view of the region 1001 in FIG.1E-1 , in accordance with some embodiments. In FIG. 3B, a partiallyarrangement of the conductive features 122 b (i.e., the island layers)covered and surrounded by the capping layers 126 a is illustrated.Similar to FIG. 3A, the top views of those conductive features 122 bhave a square shape, and those conductive features 122 b are regularlyarranged in a matrix over the surface 121 a of the insulating base 121.Unlike the trenches 118 shown in FIG. 3A, trenches 118 a adjacent to theconductive features 122 b (which are respectively covered and surroundedby a capping layer 126 a) have a bottom formed of the passivation layer126. The trench 118 a also provides a space to allow the subsequentencapsulating layer 140 formed therein, so that a portion of theencapsulating layer 140 is sandwiched by the conductive features 122 b(which are covered and surrounded by the capping layers 126 a), as shownin FIG. 1E-1 .

However, as one having ordinary skill in the art will recognize, thearrangement, the shape, and the number of the conductive features 122 bdescribed above are merely exemplary and are not meant to limit thecurrent embodiments. The shape and the number of the conductive features122 b can be varied or modified in some other embodiments. For example,the conductive features 122 b may have a circular, triangular, orrectangular shape, as viewed from a top-view perspective, and the numberof the conductive features 122 b may be more or less than that shown inFIG. 3B. Moreover, those conductive features 122 b also can beirregularly arranged in some other embodiments.

FIG. 1E-2 shows a cross-sectional representation of a semiconductorpackage 10 c, in accordance with some embodiments. The semiconductorpackage 10 c is similar to the semiconductor package 10 a shown in FIG.1E, except that there are not conductive features 122 b and cappinglayers 126 a formed over the surface 121 a of the insulating base 121 ofthe interposer structure 120. In some embodiments, those structuresincluding the conductive features 122 b and capping layers 126 a arereplaced by insulating island layers 126 c, as shown in FIG. 1E-2 . Insome embodiments, the insulating island layers 126 c and the passivationlayer 126 are made of a same layer, such as an insulating materiallayer. Moreover, the insulating island layers 126 c are spaced apartfrom and surrounded by the passivation layer 126. Methods and materialsused to form the semiconductor package 10 b in FIG. 1E-1 may be the sameas, or similar to those used to form the semiconductor package 10 a andare not repeated herein.

Referring to FIG. 3C, which shows a plan view of the region 1002 in FIG.1E-2 , in accordance with some embodiments. In FIG. 3C, a partiallyarrangement of the insulating island layers 126 c is illustrated.Similar to FIG. 3A, the top views of those insulating island layers 126c have a square shape, and those insulating island layers 126 c areregularly arranged in a matrix over the surface 121 a of the insulatingbase 121. Moreover, like the trenches 118 shown in FIG. 3A, trenches 118b are formed adjacent to the insulating island layers 126 c. The trench118 b also provides a space to allow the subsequent encapsulating layer140 formed therein, so that a portion of the encapsulating layer 140 issandwiched by the insulating island layers 126 c, as shown in FIG. 1E-2.

However, as one having ordinary skill in the art will recognize, thearrangement, the shape, and the number of the insulating island layers126 c described above are merely exemplary and are not meant to limitthe current embodiments. The shape and the number of the insulatingisland layers 126 c can be varied or modified in some other embodiments.For example, the insulating island layers 126 c may have a circular,triangular, or rectangular shape, as viewed from a top-view perspective,and the number of the insulating island layers 126 c may be more or lessthan that shown in FIG. 3C. Moreover, those insulating island layers 126c also can be irregularly arranged in some other embodiments.

Although the semiconductor packages 10 a, 10 b, and 10 c respectivelyshown in FIGS. 1E, 1E-1, and 1E-2 include the interposer structure 120with through-vias 130 therein, embodiments of the disclosure are notlimited thereto. Many variations and/or modifications can be made toembodiments of the disclosure.

FIG. 4A shows a cross-sectional representation of a semiconductorpackage 20 a, in accordance with some embodiments. The semiconductorpackage 20 a is similar to the semiconductor package 10 a shown in FIG.1E, except that the interposer structure 120 further includes dummythrough-vias 130 a formed in the insulating base 121 and respectivelycorresponding to the conductive features 122 b (i.e., the island layers)and the conductive features 124 b. In some embodiments, the dummythrough-vias 130 a are in contact with the conductive features 122 b and124 b. In some other embodiments, the dummy through-vias 130 a are notin contact with the conductive features 124 b if the conductive features124 b serve as the trace or routing layers. In some embodiments, themethod and material used to form the dummy through-vias 130 a in FIG. 4Amay be the same as, or similar to those used to form the through-vias130 and are not repeated herein. In some other embodiments, the dummythrough-vias 130 a are made be made of a polymer material (such asresin) or an insulating material (such as ceramic). Methods andmaterials used to form the semiconductor package 20 a in FIG. 4A may bethe same as, or similar to those used to form the semiconductor package10 a and are not repeated herein.

It should be noted that the warpage of the interposer structure 120 mayoccur when the interposer structure 120 is thin. If the interposerstructure 120 is warped or bent toward to the semiconductor die 114, thegap between the interposer structure 120 and the semiconductor die maynot be filled with the liquid molding compound material. Therefore,unwanted voids may form in the gap. Moreover, the warped interposerstructure is also detrimental to the package warpage control. Therefore,the reliability of the package structure is decreased and the processesfor handling and manufacturing the package structure become moredifficult. However, the use of the dummy through-vias 130 a caneffectively enhance the rigidity of the interposer structure 120,thereby preventing the interposer structure 120 from being warped. As aresult, the reliability of the package structure can be increased andbetter processes control for handling and manufacturing the packagestructure can be obtained.

Referring to FIG. 4B, which shows a plan view of the region 2000 in FIG.4A, in accordance with some embodiments. In FIG. 4B, a partiallyarrangement of the conductive features 122 b (i.e., the island layers)covered and surrounded by the capping layers 126 a and having dummythrough-vias 130 a formed thereon is illustrated. In some embodiments,the top views of those conductive features 122 b and the dummythrough-vias 130 a have a circular shape, and the dummy through-via 130a has a diameter less than that of the conductive feature 122 b. Forexample, the diameter of the dummy through-via is in a range from about5 μm to about 300 μm. Similar to the arrangement shown in FIG. 3A, thoseconductive features 122 b and the dummy through-vias 130 a are regularlyarranged in a matrix.

However, as one having ordinary skill in the art will recognize, thearrangement, the shape, and the number of the conductive features 122 band those of the dummy through-vias 130 a described above are merelyexemplary and are not meant to limit the current embodiments. The shapeand the number of both the conductive features 122 b and the dummythrough-vias 130 a can be varied or modified in some other embodiments.For example, they may have a square, triangular, or rectangular shape,as viewed from a top-view perspective. Moreover, the number of them maybe more or less than that shown in FIG. 4B, so as to tuning the rigidityof the interposer structure 120 via the dummy through-vias 130 a.Moreover, those conductive features 122 b and those dummy through-vias130 a also can be irregularly arranged in some other embodiments.

FIG. 5A shows a cross-sectional representation of a semiconductorpackage 20 b, in accordance with some embodiments. The semiconductorpackage 20 b is similar to the semiconductor package 10 b shown in FIG.1E-1 , except that the interposer structure 120 further includes dummythrough-vias 130 a formed in the insulating base 121 and respectivelycorresponding to the conductive features 122 b (i.e., the island layers)and the conductive features 124 b. In some embodiments, the dummythrough-vias 130 a are in contact with the conductive features 122 b and124 b. In some other embodiments, the dummy through-vias 130 a are notin contact with the conductive features 124 b if the conductive features124 b serve as the trace or routing layers. In some embodiments, themethod and material used to form the dummy through-vias 130 a in FIG. 5Amay be the same as, or similar to those used to form the dummythrough-vias 130 a in FIG. 4A and are not repeated herein. Methods andmaterials used to form the semiconductor package 20 b in FIG. 5A may bethe same as, or similar to those used to form the semiconductor package10 a or the semiconductor package 20 a and are not repeated herein.

Referring to FIG. 5B, which shows a plan view of the region 2001 in FIG.5A, in accordance with some embodiments. In FIG. 5B, a partiallyarrangement of the conductive features 122 b (i.e., the island layers)covered and surrounded by the capping layers 126 a and having dummythrough-vias 130 a formed thereon is illustrated. Similar to FIG. 4B,the top views of those conductive features 122 b and the dummythrough-vias 130 a have a circular shape, and the dummy through-via 130a has a diameter less than that of the conductive feature 122 b. Forexample, the diameter of the dummy through-via is in a range from about5 μm to about 300 μm. Similar to the arrangement shown in FIG. 4B, thoseconductive features 122 b and the dummy through-vias 130 a are regularlyarranged in a matrix.

However, as one having ordinary skill in the art will recognize, thearrangement, the shape, and the number of the conductive features 122 band those of the dummy through-vias 130 a described above are merelyexemplary and are not meant to limit the current embodiments. The shapeand the number of both the conductive features 122 b and the dummythrough-vias 130 a can be varied or modified in some other embodiments.For example, they may have a square, triangular, or rectangular shape,as viewed from a top-view perspective. Moreover, the number of them maybe more or less than that shown in FIG. 5B. Moreover, those conductivefeatures 122 b and those dummy through-vias 130 a also can beirregularly arranged in some other embodiments.

FIG. 6A shows a cross-sectional representation of a semiconductorpackage 20 c, in accordance with some embodiments. The semiconductorpackage 20 c is similar to the semiconductor package 10 c shown in FIG.1E-2 , except that the interposer structure 120 further includes dummythrough-vias 130 a formed in the insulating base 121 and respectivelycorresponding to the insulating island layers 126 c and the conductivefeatures 124 b. In some embodiments, the dummy through-vias 130 a are incontact with the conductive features 122 b and 124 b. In some otherembodiments, the dummy through-vias 130 a are not in contact with theconductive features 124 b if the conductive features 124 b serve as thetrace or routing layers. In some embodiments, the method and materialused to form the dummy through-vias 130 a in FIG. 6A may be the same as,or similar to those used to form the dummy through-vias 130 a in FIG. 4Aand are not repeated herein. Methods and materials used to form thesemiconductor package 20 c in FIG. 6A may be the same as, or similar tothose used to form the semiconductor package 10 a or the semiconductorpackage 20 a and are not repeated herein.

Referring to FIG. 6B, which shows a plan view of the region 2002 in FIG.6A, in accordance with some embodiments. In FIG. 6B, a partiallyarrangement of the insulating island layers 126 c having dummythrough-vias 130 a formed thereon is illustrated. Similar to FIG. 4B,the top views of those insulating island layers 126 c and the dummythrough-vias 130 a have a circular shape, and the dummy through-via 130a has a diameter less than that of the insulating island layers 126 c.For example, the diameter of the dummy through-via is in a range fromabout 5 μm to about 300 μm. Similar to the arrangement shown in FIG. 4B,those insulating island layers 126 c and the dummy through-vias 130 aare regularly arranged in a matrix.

However, as one having ordinary skill in the art will recognize, thearrangement, the shape, and the number of the insulating island layers126 c and those of the dummy through-vias 130 a described above aremerely exemplary and are not meant to limit the current embodiments. Theshape and the number of both the insulating island layers 126 c and thedummy through-vias 130 a can be varied or modified in some otherembodiments. For example, they may have a square, triangular, orrectangular shape, as viewed from a top-view perspective. Moreover, thenumber of them may be more or less than that shown in FIG. 6B. Moreover,those insulating island layers 126 c and those dummy through-vias 130 aalso can be irregularly arranged in some other embodiments.

Many variations and/or modifications can be made to embodiments of thedisclosure. FIGS. 7A to 7D show cross-sectional representations ofvarious stages of forming a semiconductor package 30 a, in accordancewith some embodiments. A structure similar to the structure shown inFIG. 1C is provided or formed, as shown in FIG. 7A in accordance withsome embodiments. Unlike to FIG. 1C, FIG. 7A illustrates two adjacentsemiconductor dies 114 formed over the interconnect structure 110 a andrespectively capped by an interposer structure 120 a, and an adhesivelayer 135 is formed over the interposer structures 120 a. In someembodiments, the adhesive layer 135 is a release film such as alight-to-heat-conversion (LTHC) film. In some other embodiments, theadhesive layer 125 is a composite film, such as a silicon type oracrylic type resin. However, any other suitable material may beutilized, such as adhesive tape or glue. Moreover, unlike the structureshown in FIG. 1C, there is not an underfill material 115 filling the gapbetween the interconnect structure 110 a and each semiconductor die 114.However, in some other embodiments, there is an underfill material 115(as shown in FIG. 1C) filling the gap between the interconnect structure110 a and each semiconductor die 114 if desired.

In some embodiments, the interposer structure 120 a has a structuresimilar to the interposer structure 120 shown in FIG. 1C. Methods andmaterials used to form the interposer structure 120 a may be the same asor similar to those used to form the interposer structure 120 shown inFIG. 1C and are not repeated herein. In some embodiments, the interposerstructure 120 a includes an insulating base 121 with conductive features122 a, 122 b, 124 a, and 124 b and passivation layers 126 and 128 onopposite surfaces 121 a and 121 b of the insulating base 121, andthrough-vias 130 in the insulating base 121, as shown in FIG. 7A. Insome other embodiments, one or more conductive features (such as tracelayers or routing layers) are built within the insulating base 121. Insome embodiments, the interposer structure 120 a has a height H2 that isin a range from about 50 μm to about 900 μm. For example, the height H2of the interposer structure 120 a may be in a range from about 50 μm toabout 300 μm.

In some embodiments, the conductive features 122 a and 124 a are used aspads that are arranged along one or more peripheral edges 121 c of theinsulating base 121 and respectively in contact with or electricallycoupled to opposite ends of the through-vias 130. In some embodiments,the conductive features 122 b and 124 b serve as trace layers withdesired circuit pattern. In some other embodiments, the conductivefeatures 122 b do not serve as trace layers, but serve as dummy padswith island-shaped and therefore are also referred to as island layers.In some embodiments, the conductive features 122 b and 124 b aresurrounding by the conductive features 122 a and 124 a.

Passivation layers 126 and 128 are respectively formed over the oppositesurfaces 121 a and 121 b of the insulating base 121, as shown in FIG. 7Ain accordance with some embodiments. In some embodiments, thepassivation layer 126 have multiple openings that partially expose eachof the conductive features 122 a and entirely covering all of theconductive features 122 a.

Alternatively, the passivation layer 126 and the conductive features 122b have a configuration that is the same as that of the passivation layer126 and the conductive features 122 b in the interposer structure 120shown in FIG. 1E or 1E-1 , so that each of the conductive features 122 bis covered and surrounded by a capping layer 126 a. In some otherembodiments, the conductive features 122 b in the interposer structure120 a can be replaced by the insulating island layers 126 c shown inFIG. 1E-2 , so that those insulating island layers 126 c are separatedfrom and surrounded by the passivation layer 126.

In some embodiments, the passivation layer 128 is covered by theadhesive layer 135 and has multiple openings that partially expose eachof the conductive features 124 a and entirely covering all of theconductive features 122 b. Moreover, the passivation layer 128 has arecess 128 a extended along the peripheral edges 121 c of the insulatingbase 121 to surround the conductive features 124 a. In some embodiments,the recess 128 a has a bottom formed of the passivation layer 128. Inother words, the bottom surface of the recess 128 a is between the topsurface and the bottom surface of the passivation layer 128, as shown inFIG. 7A. In some other embodiments, the recess 128 a extends through thepassivation layer 128 to expose the second surface 121 b of theinsulating base 121. In some embodiments, the recess 128 a is formedusing a laser drilling process or another suitable a patterning process(such as lithography and etching processes).

Since the passivation layer 128 is covered by the adhesive layer 135,those openings that partially expose each of the conductive features 124a and the recess 128 a are filled with the adhesive layer 135, as shownin FIG. 7A. The adhesive layer 135 is employed to fix the separateinterposer structure 120 a and protect the exposed conductive features124 a (i.e., pads for electrically connecting external devices (notshown, such as a memory device (e.g., DRAM)).

In some embodiments, the interposer structure 120 a further includesdummy through-vias 130 a (as shown in FIG. 4A, 5A, or 6A) formed in theinsulating base 121, so as to enhance the rigidity of the interposerstructure 120 a.

Afterwards, an encapsulating layer 140 fills in the space between theinterconnect structure 110 a and the interposer structure 120 a, asshown in FIG. 7B, in accordance with some embodiments. The encapsulatinglayer 140 surrounds and protects the connectors 132. The encapsulatinglayer 140 also covers and surrounds the semiconductor dies 114, so as tofill the gap between the capping layers 126 and the semiconductor die114 and the gap between the interconnect structure 110 a and each ofsemiconductor dies 114. As described above, in the embodiments that thepassivation layer 126 and the conductive features 122 b have aconfiguration that is the same as that of the passivation layer 126 andthe conductive features 122 b in the interposer structure 120 shown inFIG. 1E or 1E-1 , a portion of the encapsulating layer 140 is sandwichedby the conductive features 122 b (i.e., the island layers) covered andsurrounded by the capping layers 126 a.

In some embodiments, a liquid encapsulating material (not shown) isapplied over the semiconductor dies 114 and flows into the space betweenthe interconnect structure 110 a and the interposer structure 120 a. Athermal process is then used to cure the liquid encapsulating materialto form the encapsulating layer 140.

It should be noted that although the passivation layer 128 is covered bythe adhesive layer 135 (i.e., the protective layer), the liquidencapsulating material may flow between the top surface of thepassivation layer 128 and the adhesive layer 135 during the formation ofthe encapsulating layer 140. As a result, the liquid encapsulatingmaterial may creep across the top surface of the passivation layer 128to contaminate pads (i.e., the conductive features 124 a) that areexposed from the passivation layer 128. However, the recess 128 a in thepassivation layer 128 of the interposer structure 120 a can serve a moatfor receiving the creeping liquid encapsulating material, therebyeffectively preventing the pads (i.e., the conductive features 124 a)from being contaminated by the creep of liquid encapsulating material.In some embodiments, the recess 128 a also provides more contact areafor enhancing the filling of the adhesive layer 135. Therefore, thecreep of liquid encapsulating material can be mitigated.

Afterwards, the adhesive layer 315, the carrier substrate 100 and theadhesive layer 102 are removed from the structure shown in FIG. 7B, andexternal connectors 150 are formed, as shown in FIG. 7C in accordancewith some embodiments. In some embodiments, after the carrier substrate100 and the adhesive layer 102 are removed to expose the bottom surfaceof the interconnect structure 110 a (i.e., the surface of theinterconnect structure 110 a opposite the semiconductor die 114), theexternal connectors 150 are formed over the bottom surface of theinterconnect structure 110 a. In some other embodiments, optional UBMlayers are formed over the exposed bottom surface of the interconnectstructure 110 a prior to the formation of the solder bumps.

Afterwards, a singulation process is carried out to saw through theformed structure shown in FIG. 7C, in accordance with some embodiments.As a result, multiple separate semiconductor packages 30 a are formed.In FIG. 7D, one of the semiconductor packages 30 a is shown.

Referring to FIGS. 8A and 8B, in which FIG. 8A is an enlargedcross-sectional representation of the region 3000 in FIG. 7D, inaccordance with some embodiments. FIG. 8B is a plan view of theinterposer structure 120 a having the recess 128 a shown in FIG. 8A, inaccordance with some embodiments. The ring-shaped recess 128 a surroundsthe conductive features 124 a and is laterally spaced a distance apartfrom the peripheral edges 121 c of the insulating base 121, as shown inFIG. 8A and/or FIG. 8B in accordance with some embodiments. As shown inFIG. 8A and/or FIG. 8B, the recess 128 a has a width W1 and a depth D1.Moreover, the opening formed in the passivation layer 128 to expose theconductive feature 124 a (e.g., the pad) has a sidewall that islaterally spaced a distance S1 apart from one of the peripheral edges121 c (the one closest to the sidewall of the opening), and thepassivation layer 128 has a thickness T1. In some embodiments, the widthW1 of the recess 128 a is in a range from about 5 μm to about 500 μm andis less than the distance S1. In some embodiments, the thickness T1 ofthe passivation layer 128 is in a range from about 5 μm to about 50 μmand is greater than or equal to the depth D1 of the recess 128 a.

Although the passivation layer 128 shown in FIG. 8B has a recess 128 awith a top-view of a continuous ring-shaped configuration, embodimentsof the disclosure are not limited thereto. Many variations and/ormodifications can be made to embodiments of the disclosure.

FIG. 8C is a plan view of the interposer structure 120 a having recesses128 b, in accordance with some embodiments. Similar to the recess 128 ashown in FIG. 8B, each of the recesses 128 b has a width W1 and a depthD1. Moreover, in some embodiments, the width W1 of the recess 128 b isin a range from about 5 μm to about 500 μm and is less than the distanceS1. Unlike the ring-shaped recess 128 a shown in FIG. 8B, those recesses128 b has a top-view of rectangular configuration. Moreover, some of therecesses 128 b (e.g., first recesses) are arranged at and extended alongthe peripheral edges 121 c of the insulating base 121, and some of therecesses 128 b (e.g., second recesses) are arranged at peripheralcorners 121 d of the insulating base 121 and adjacent to some of thefirst recesses, so as to form a discontinuous ring surrounding theconductive features 124 a.

Although the interposer structure 120 a shown in FIG. 8B includes apassivation layer 128 having a recess 128 a that is laterally spaced adistance apart from the peripheral edges 121 c of the insulating base121, embodiments of the disclosure are not limited thereto. Manyvariations and/or modifications can be made to embodiments of thedisclosure.

Referring to FIGS. 9A and 9B, in which FIG. 9A is an enlargedcross-sectional representation of a recess 128 c for the structure shownin FIG. 7D, in accordance with some embodiments. FIG. 9B is a plan viewof the interposer structure 120 a having the recess 128 c shown in FIG.9A, in accordance with some embodiments. The ring-shaped recess 128 csurrounds the conductive features 124 a and has a sidewall surface 127 aand a bottom surface 127 b extending from the sidewall surface 127 a tothe peripheral edges 121 c of the insulating base 121, as shown in FIG.9A and/or FIG. 9B in accordance with some embodiments. As shown in FIG.9A and/or FIG. 9B, the recess 128 c has a width W2 and a depth D1.Moreover, the opening formed in the passivation layer 128 to expose theconductive feature 124 a (e.g., the pad) has a sidewall that islaterally spaced a distance S1 apart from one of the peripheral edges121 c (the one that is closest to the sidewall of the opening), and thepassivation layer 128 has a thickness T1. In some embodiments, the widthW2 of the recess 128 a is in a range from about 5 μm to about 500 μm andis less than the distance S1. In some embodiments, the thickness T1 ofthe passivation layer 128 is in a range from about 5 μm to about 50 μmand is greater than or equal to the depth D1 of the recess 128 a.

Although the passivation layer 128 shown in FIG. 9B has a recess 128 cwith a top-view of a continuous ring-shaped configuration, embodimentsof the disclosure are not limited thereto. Many variations and/ormodifications can be made to embodiments of the disclosure.

FIG. 9C is a plan view of the interposer structure 120 a having recesses128 d, in accordance with some embodiments. Similar to the recess 128 cshown in FIG. 9B, each of the recesses 128 d has a width W2 and a depthD1. Moreover, in some embodiments, the width W2 of the recess 128 d isin a range from about 5 μm to about 500 μm and is less than the distanceS1. Unlike the ring-shaped recess 128 c shown in FIG. 9B, those recess128 d has a top-view of rectangular configuration. Moreover, some of therecesses 128 d (e.g., first recesses) are arranged at and extended alongthe peripheral edges 121 c of the insulating base 121, and some of therecesses 128 d (e.g., second recesses) are arranged at peripheralcorners 121 d of the insulating base 121 and adjacent to some of thefirst recesses, so as to form a discontinuous ring surrounding theconductive features 124 a.

Although the interposer structure 120 a shown in FIG. 8B includes apassivation layer 128 having a recess 128 a with a uniform width (e.g.,the width W1), embodiments of the disclosure are not limited thereto.Many variations and/or modifications can be made to embodiments of thedisclosure.

Referring to FIGS. 10A and 10B, in which FIG. 10A is an enlargedcross-sectional representation of a ring-shaped recess for the structureshown in FIG. 7D, in accordance with some embodiments. FIG. 10B is aplan view of the interposer structure 120 a having the ring-shapedrecess shown in FIG. 10A that has two widths W1 and W3, in accordancewith some embodiments. Similar to the ring-shaped recess 128 a shown inFIG. 8B, the ring-shaped recess surrounds the conductive features 124 aand is laterally spaced a distance apart from the peripheral edges 121 cof the insulating base 121, as shown in FIGS. 10A and 10B in accordancewith some embodiments. As shown in FIGS. 10A and 10B, the ring-shapedrecess has first portions 128 a′ that correspond to the respectiveperipheral edges 121 c of the insulating base 121, and second portions128 a″ adjoining the first portions 128 a′ and that corresponding to therespective peripheral corners 121 d of the insulating base 121, inaccordance with some embodiments. Each of the first portions 128 a′ hasa width W1 and each of the second portions 128 a″ has a width W3 that isdifferent from the width W1. In some embodiments, the width W1 is lessthan the width W3. The first portions 128 a′ and the second portions 128a″ have the same depth (e.g., the depth D1). Moreover, the openingformed in the passivation layer 128 to expose the conductive feature 124a (e.g., the pad) has a sidewall that is laterally spaced a distance S1apart from one of the peripheral edges 121 c (the one closest to thesidewall of the opening), and the passivation layer 128 has a thicknessT1. In some embodiments, the width W1 and the width W3 are less than thedistance S1. In some embodiments, the thickness T1 of the passivationlayer 128 is greater than or equal to the depths D1 of the firstportions 128 c′ and the second portions 128 c″ of the recess.

Although the passivation layer 128 shown in FIG. 10B has a recess with atop-view of a continuous ring-shaped configuration, embodiments of thedisclosure are not limited thereto. Many variations and/or modificationscan be made to embodiments of the disclosure.

FIG. 10C is a plan view of the interposer structure 120 a havingrecesses 128 b and 128 b′ with different widths, in accordance with someembodiments. Similar to the recess including the first portions 128 a′and the second portions 128 a″ shown in FIG. 10B, each of the recesses128 b has a width W1 and each of the recesses 128 b′ has a width W3 thatis different from the width W1. In some embodiments, the width W1 isless than the width W3. The recesses 128 b and the recesses 128 b′ havethe same depth (e.g., the depth D1). Unlike the ring-shaped recess shownin FIG. 10B, the recesses 128 b has a top-view of rectangularconfiguration and the recesses 128 b′ has a top-view of squareconfiguration. Moreover, the recesses 128 b are arranged at and extendedalong the peripheral edges 121 c of the insulating base 121, and therecesses 128 b′ are arranged at peripheral corners 121 d of theinsulating base 121 and adjacent to some of the recesses 128 b, so as toform a discontinuous ring surrounding the conductive features 124 a.

Although the interposer structure 120 a shown in FIG. 10B includes apassivation layer 128 having a recess including the first portions 128a′ and the second portions 128 a″ that is laterally spaced a distanceapart from the peripheral edges 121 c of the insulating base 121,embodiments of the disclosure are not limited thereto. Many variationsand/or modifications can be made to embodiments of the disclosure.

Referring to FIGS. 11A and 11B, in which FIG. 11A is an enlargedcross-sectional representation of a ring-shaped recess for the structureshown in FIG. 7D, in accordance with some embodiments. FIG. 11B is aplan view of the interposer structure 120 a having the ring-shapedrecess shown in FIG. 11A that has two widths W2 and W4, in accordancewith some embodiments. Similar to the ring-shaped recess shown in FIG.9B, the ring-shaped recess surrounds the conductive features 124 a andhas a sidewall surface 127 a and a bottom surface 127 b extending fromthe sidewall surface 127 a to the peripheral edges 121 c of theinsulating base 121, as shown in FIGS. 11A and 11B in accordance withsome embodiments. As shown in FIG. 11A and/or FIG. 11B, the ring-shapedrecess has first portions 128 c′ that correspond to the respectiveperipheral edges 121 c of the insulating base 121, and second portions128 c″ adjoining the first portions 128 c′ and that correspond to therespectively peripheral corners 121 d of the insulating base 121, inaccordance with some embodiments. Each of the first portions 128 c′ hasa width W2 and each of the second portions 128 c″ has a width W4 that isdifferent from the width W2. In some embodiments, the width W2 is lessthan the width W4. The first portions 128 c′ and the second portions 128c″ have the same depth (e.g., the depth D1). Moreover, the openingformed in the passivation layer 128 to expose the conductive feature 124a (e.g., the pad) has a sidewall that is laterally spaced a distance S1apart from one of the peripheral edges 121 c (the closest one to thesidewall of the opening), and the passivation layer 128 has a thicknessT1. In some embodiments, the width W2 and the width W4 are less than thedistance S1. In some embodiments, the thickness T1 of the passivationlayer 128 is greater than or equal to the depths D1 of the firstportions 128 c′ and the second portions 128 c″ of the recess.

Although the passivation layer 128 shown in FIG. 11B has a recess with atop-view of a continuous ring-shaped configuration, embodiments of thedisclosure are not limited thereto. Many variations and/or modificationscan be made to embodiments of the disclosure.

FIG. 11C is a plan view of the interposer structure 120 a havingrecesses 128 d and 128 d′ with different widths, in accordance with someembodiments. Similar to the recess including the first portions 128 c′and the second portions 128 c″ shown in FIG. 11B, each of the recesses128 d has a width W2 and each of the recesses 128 d′ has a width W4 thatis different from the width W2. In some embodiments, the width W2 isless than the width W4. The recesses 128 d and the recesses 128 d′ havethe same depth (e.g., the depth D1). Unlike the ring-shaped recess shownin FIG. 11B, the recesses 128 d has a top-view of rectangularconfiguration and the recesses 128 d′ has a top-view of squareconfiguration. Moreover, the recesses 128 d are arranged at and extendedalong the peripheral edges 121 c of the insulating base 121, and therecesses 128 d′ are arranged at peripheral corners 121 d of theinsulating base 121 and adjacent to some of the recesses 128 d, so as toform a discontinuous ring surrounding the conductive features 124 a.

Embodiments of semiconductor packages and methods for forming the sameare provided. The semiconductor package includes an interposer structureformed over the encapsulating layer that covers a semiconductor die onthe interconnect structure. The interposer structure includes aninsulating base and island layers that is arranged on the surface of theinsulating base and corresponds to the semiconductor die. The islandlayers facilitate the flowability of an encapsulating material betweenthe semiconductor die and the interposer structure. As a result, the gapbetween the semiconductor die and the interposer structure can be filledwith the subsequently formed encapsulating layer to prevent voids fromforming in the gap, thereby increasing the reliability of thesemiconductor package.

In some embodiments, a semiconductor package is provided. Thesemiconductor package includes an encapsulating layer, a semiconductordie formed in the encapsulating layer, and an interposer structurecovering the encapsulating layer. The interposer structure includes aninsulating base having a first surface facing the encapsulating layer,and a second surface opposite the first surface. The interposerstructure also includes insulting features formed on the first surfaceof the insulating base and extending into the encapsulating layer. Theinsulting features are arranged in a matrix and face a top surface ofthe semiconductor die. The interposer structure further includes firstconductive features formed on the first surface of the insulating baseand extending into the encapsulating layer. The first conductivefeatures surround the matrix of the plurality of insulting features.

In some embodiments, a semiconductor package is provided. Thesemiconductor package includes an encapsulating layer, a semiconductordie formed in the encapsulating layer, and an interposer structureformed over the encapsulating layer. The interposer structure includesan insulating base having a first surface facing the encapsulatinglayer, and a second surface opposite the first surface. The interposerstructure also includes a passivation layer covering the second surfaceof the insulating base. The passivation layer has a ring-shaped recessextending along peripheral edges of the insulating base. The ring-shapedrecess has a width greater than a distance between one of the peripheraledges of the insulating base and the ring-shaped recess.

In some embodiments, a semiconductor package is provided. Thesemiconductor package includes an encapsulating layer, a semiconductordie formed in the encapsulating layer, an interposer structure formedover the encapsulating layer. The interposer structure includes aninsulating base having a first surface facing the encapsulating layer,and a second surface opposite the first surface. The interposerstructure also includes a passivation layer covering the second surfaceof the insulating base. The passivation layer has a first recessarranged at a peripheral edge of the insulating base and a second recessarranged at a peripheral corner of the insulating base and adjacent tothe first recess. The first recess has a first width greater than adistance between the peripheral edge of the insulating base and thefirst recess. The second recess has a second width greater than adistance between the peripheral edge of the insulating base and thesecond recess.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A semiconductor package, comprising: anencapsulating layer; a semiconductor die formed in the encapsulatinglayer; and an interposer structure formed over the encapsulating layer,comprising: an insulating base having a first surface facing theencapsulating layer, and a second surface opposite the first surface;and a passivation layer covering the second surface of the insulatingbase, wherein the passivation layer has a ring-shaped recess extendingalong peripheral edges of the insulating base, and wherein thering-shaped recess has a width greater than a distance between one ofthe peripheral edges of the insulating base and the ring-shaped recess.2. The semiconductor package as claimed in claim 1, further comprising:a plurality of pads formed over the second surface of the insulatingbase and arranged in a first ring that extends along peripheral edges ofthe insulating base, wherein a plurality of openings formed in thepassivation layer and arranged in a second ring to correspondinglyexpose the plurality of pads, and wherein a distance between the secondring and the ring-shaped recess is greater than the distance between oneof the peripheral edges of the insulating base and the ring-shapedrecess.
 3. The semiconductor package as claimed in claim 2, furthercomprising: a connector formed in the encapsulating layer andelectrically coupled to one of the plurality of pads; and aninterconnect structure formed below the encapsulating layer andelectrically coupled to the semiconductor die and the connector.
 4. Thesemiconductor package as claimed in claim 3, wherein the interposerstructure further comprises a through-via formed in the insulating baseand electrically coupled between the connector and the one of theplurality of pads.
 5. The semiconductor package as claimed in claim 1,wherein the ring-shaped recess has first portions corresponding to theperipheral edges of the insulating base, and second portions adjoiningthe first portions and corresponding to peripheral corners of theinsulating base, and wherein each of the first portions has a smallerwidth than that of each of the second portions.
 6. The semiconductorpackage as claimed in claim 1, wherein the ring-shaped recess extendsthrough the passivation layer to expose the second surface of theinsulating base.
 7. A semiconductor package, comprising: anencapsulating layer; a semiconductor die formed in the encapsulatinglayer; and an interposer structure formed over the encapsulating layer,comprising: an insulating base having a first surface facing theencapsulating layer, and a second surface opposite the first surface;and a passivation layer covering the second surface of the insulatingbase, wherein the passivation layer has a ring-shaped recess extendingalong peripheral edges of the insulating base, wherein the ring-shapedrecess includes a plurality of first recesses with a first widtharranged at a plurality of peripheral edges of the insulating base and aplurality of second recesses with a second width arranged at a pluralityof peripheral corners of the insulating base, and wherein the firstwidth is greater than a distance between at least one of the peripheraledges of the insulating base and the first recess, and the second widthis greater than a distance between the at least one of the peripheraledges of the insulating base and the second recess.
 8. The semiconductorpackage as claimed in claim 7, wherein the first width is smaller thanthe second width.
 9. The semiconductor package as claimed in claim 7,further comprising: a plurality of pads formed over the second surfaceof the insulating base and arranged in a first line that extends alongthe at least one of the peripheral edges of the insulating base, whereina plurality of openings formed in the passivation layer and arranged ina second line to correspondingly expose the plurality of pads, andwherein a distance between the second line and the first recess isgreater than the distance between the at least one of the peripheraledges of the insulating base and the first recess and the distancebetween the at least one of the peripheral edges of the insulating baseand the second recess.
 10. The semiconductor package as claimed in claim9, further comprising: a connector formed in the encapsulating layer andelectrically coupled to one of the plurality of pads; and aninterconnect structure formed below the encapsulating layer andelectrically coupled to the semiconductor die and the connector.
 11. Thesemiconductor package as claimed in claim 9, wherein the interposerstructure further comprises: a through-via formed in the insulating baseand electrically coupled to one the plurality of pads.
 12. Thesemiconductor package as claimed in claim 7, wherein the interposerstructure further comprises: a plurality of dummy pads formed on thefirst surface of the insulating base and faces a top surface of thesemiconductor die; and a plurality of dummy through-vias formed in theinsulating base and correspondingly in direct contact with the pluralityof dummy pads, wherein the plurality of dummy pads is arranged in amatrix.
 13. A semiconductor package, comprising: an encapsulating layer;a semiconductor die formed in the encapsulating layer; and an interposerstructure covering the encapsulating layer, comprising: an insulatingbase having a first surface facing the encapsulating layer, and a secondsurface opposite the first surface; a plurality of first conductivefeatures formed on the first surface of the insulating base, wherein theplurality of first conductive features is arranged in a matrix and facesa top surface of the semiconductor die; a plurality of second conductivefeatures formed on the first surface of the insulating base, wherein theplurality of second conductive features surrounds the matrix; and afirst passivation layer covering the second surface of the insulatingbase, wherein the first passivation layer has a recess structuresurrounding the matrix, as viewed from a top-view perspective.
 14. Thesemiconductor package as claimed in claim 13, wherein the interposerstructure further comprises: a second passivation layer covering thefirst surface of the insulating base and the matrix.
 15. Thesemiconductor package as claimed in claim 13, wherein the interposerstructure further comprises: a plurality of through-vias formed in theinsulating base.
 16. The semiconductor package as claimed in claim 15,wherein the interposer structure further comprises: a plurality of thirdconductive features formed on the second surface of the insulating baseand in direct contact with the plurality of the through-vias.
 17. Thesemiconductor package as claimed in claim 13, wherein the interposerstructure further comprises: a plurality of through-vias formed in theinsulating base to be in direct contact with the plurality of the secondconductive features.
 18. The semiconductor package as claimed in claim17, wherein the interposer structure further comprises: a plurality ofthird conductive features formed on the second surface of the insulatingbase and in direct contact with the plurality of the through-vias. 19.The semiconductor package as claimed in claim 13, further comprising: aninterconnect structure formed below the encapsulating layer andelectrically coupled to the semiconductor die; and a plurality ofconnectors formed in the encapsulating layer and electrically coupledbetween the interconnect structure and the plurality of secondconductive features.
 20. The semiconductor package as claimed in claim13, wherein a top view of each of the plurality of the first conductivefeatures has a square shape.